retained dose

基本解释

Lower impact energy and retained dose were found in inner surface PIII, but the former was not very serious, while the latter was.
通过模拟发现，内表面注入过程存在注入能量和注入剂量偏低的问题，但前者并不十分严重，而后者则比较严重。
Distribution of peak implant depth and retained dose were greatly influenced by pulse duration, and long pulse moved the maximum values deeper into the bore.
脉冲宽度对注入峰值深度和注入剂量的分布有很大影响，长注入脉宽使注入峰值深度和注入剂量的最大值向筒内部移动；
The deflecting electric field method we presented has been proved to be valid for inner surface PIII, and can increase retained dose and implant energy greatly.
研究表明，提出的偏转电场法是进行内表面注入处理的有效方法，可以极大提高内表面注入的注入剂量和注入能量。