photomasks

基本解释

• 掩模

同根派生

• photomasks相关词

英汉例句

• A novel method and system for photomask manufacturing rule check (MRC) were introduced.
  摘要介绍了一种较为先进的光罩可制造性规则检查的方法及其系统构成。
• The present invention discloses a producing method for a photomask and a thin-film transistor basal plate.
  本发明公开了一种光掩模及薄膜晶体管基板的制造方法。
• Xie Changqing,The Fabrication Technique for Next generation photomask, Microelectronic Technology[J]. 2000,28(6): 1-4. (in Chinese).
  [1]谢常青.;下一代光学掩模制造技术[J]
• The initial experiments on and analysis of sheet resistance, contact, photomask alignment, line width, and correlations between device parameters and dopants have been made.
  对薄层电阻、接触、光掩模对准、线条宽度、器件参数与掺杂的相关性等内容进行了初步试验和分析。
• Focus on the stability of sub-industries performance, the IC design industry has minimum volatility, secondary is lead-frame, photomask and IC packaging and testing industries.
  四、子产业绩效表现之稳定性，以IC设计业的波动最小，其次为导线架业、光罩业及IC封装测试业；

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