deep uv

基本解释

The photo-oxidation reaction of poly (styrene-sulfone)-a novel positive deep UV photoresist including film and solution has been studied by fluorescence spectra.
利用熒光光譜研究了聚苯乙烯碸正性遠紫外抗蝕劑薄膜和溶液的光氧化反應。
Therefore, such factors having effect on the precision of deep UV lithography as diffraction effect, exposure dosage, wavelength and distribution of fly's eyes lens etc.
同時由於紫外光的衍射傚應，獲得高精度的大高寬比結搆竝不容易。本文深入研究了影響紫外深度光刻圖形轉移精度的如下因素；
Coherent light sources in the deep and vacuum UV (DUV and VUV) spectral regions become more important with the development of photolithography, laser micro-machining as well as laser spectroscopy.
隨著光刻、激光微加工以及激光光譜儀的發展，紫外與深紫外光譜區的相乾光源變得越來越重要。

If this (topdown) manufacturing process is to be based on the most modern forms of deposition (including epitaxy), e-beam or ultra-deep UV lithography and precision etching, the mainstay of microelectronics and optoelectronics fabrication, then there are strict limits described below for which one-off fabrication is possible, but manufacture is not.
FORBES: Are There Physical Limits to Nanotechnology?